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Profil

Christine MARTINET
Nom:Name:MARTINET Christine
Position:Position:Ingénieur
Mel:Mail:christine.martinet[at]univ-lyon1.fr
Equipes:Teams:
  • Spectroscopies optiques des matériaux verres, amorphes et à nanoparticules
  • Support à la recherche
Plateforme:Platform:ILMTECH - Caractérisation
Bureau(x):Office(s):LIPPMANN / 2ème / 12-042
Tél(s):Phone(s):0472448334
ORCID ResearchGate Site web
10 publications à l'ILM ces 5 dernières années. 10 publications at ILM in the last 5 years. Voir les 41 publications des 15 dernières années. See 41 publications from the last 15 years.

69 publication(s) affichée(s) 69 publication(s) shown
Nonlinear microwave properties of YBaCuO thin films studied with the coplanar resonator technique BIB HAL DOI
Nonlinear microwave properties of YBaCuO thin films studied with the coplanar resonator technique DOI BIB HAL
D Seron, H Kokabi, F.R Ladan, C. Martinet, G Alquié
Physica C: Superconductivity and its Applications, vol. 372-376, p. 558-561, (2002)
Deposition of SiO2 and TiO2 thin films by plasma enhanced chemical vapor deposition for antireflection coating BIB HAL DOI
Deposition of SiO2 and TiO2 thin films by plasma enhanced chemical vapor deposition for antireflection coating DOI BIB HAL
C. Martinet, V. Paillard, A. Gagnaire, J. Joseph
Journal of Non-Crystalline Solids, vol. 216, p. 77-82, (1997)
Oxidation of crystalline Si in an O2 plasma: Growth kinetics and oxide characterization BIB HAL DOI
Oxidation of crystalline Si in an O2 plasma: Growth kinetics and oxide characterization DOI BIB HAL
C. Martinet, R. Devine, M. Brunel
Journal of Applied Physics, vol. 81, p. 6996-7005, (1997)
Low-temperature oxidation of Si in a microwave electron cyclotron resonance excited O2 plasma BIB HAL DOI
Low-temperature oxidation of Si in a microwave electron cyclotron resonance excited O2 plasma DOI BIB HAL
C. Martinet, R. Devine
Applied Physics Letters, vol. 67, p. 3500-3502, (1995)
Infrared evidence for inhomogeneity in SiO2 films grown by plasma assisted oxidation of Si BIB HAL DOI
Infrared evidence for inhomogeneity in SiO2 films grown by plasma assisted oxidation of Si DOI BIB HAL
C. Martinet, R. Devine
Applied Physics Letters, vol. 67, p. 2696-2698, (1995)
OXYDATION DU SILICIUM PAR PLASMA D'OXYGENE : CINETIQUES DE CROISSANCE ET ANALYSES PHYSIQUES DES COUCHES BIB HAL
OXYDATION DU SILICIUM PAR PLASMA D'OXYGENE : CINETIQUES DE CROISSANCE ET ANALYSES PHYSIQUES DES COUCHES BIB HAL
C. Martinet
(1995)
Analysis of the vibrational mode spectra of amorphous SiO2 films BIB HAL DOI
Analysis of the vibrational mode spectra of amorphous SiO2 films DOI BIB HAL
C. Martinet, R. Devine
Journal of Applied Physics, vol. 77, p. 4343-4348, (1995)
Comparison of Dry Development Techniques using O 2 and SO 2 /O 2 Low-Pressure Plasmas BIB HAL DOI
Comparison of Dry Development Techniques using O 2 and SO 2 /O 2 Low-Pressure Plasmas DOI BIB HAL
Michel Pons, Olivier Joubert, C. Martinet, Jacques Pelletier, Jean-Pierre Panabière, André Weill
Japanese Journal of Applied Physics, vol. 33, p. 991, (1994)
Influence of ion energy on the physical properties of plasma deposited SiO2 fims BIB HAL
Influence of ion energy on the physical properties of plasma deposited SiO2 fims BIB HAL
R. Burke, L. Vallier, C. Martinet, R. A. B. Devine, O. R. Joubert
Applied Physics Letters, vol. 62(3), p. 228, (1993)
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