Séminaire

Vendredi 7 Octobre 2022 à 11h00.

Mechanisms of silicon allotropes' crystallization in condensed media by in situ diffraction of synchrotron radiation


Alexandre Courac
(Sorbonne University)

Salle séminaires Lippman

Invité(e) par
Vittoria Pischedda

présentera en 1 heure :

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HP research on Si started more than 50 years ago and since then several allotropes, displaying a wide variety of physical properties, have been reported.1-5
The narrow-bandgap semiconductor6 Si-III4 with BC8 structure (originally believed to be semimetal) can be obtained from the high-pressure tetragonal metallic phase, Si-II, formed during compression of common silicon according to Si-I→Si-II (Figure 1). Such a transformation during decompression can be either direct, Si-II→Si-III, or with an intermediate step Si-II→Si-XII→SiIII. Our in situ studies of pure Si in oxygen-free environment indicated that in the absence of pressure medium, Si-I remains metastable at least up to ~14 GPa, while the pressure medium allows reducing the onset pressure of transformation to ~10 GPa.
Upon heating Si-III at ambient pressure a hexagonal structure, named Si-IV, was observed. This allotrope was believed to be a structural analogue of the hexagonal diamond found in meteorites (called also lonsdaleite) with the 2H polytypestructure. Calculations have predicted several hexagonal polytypes of Si and of other Group-IV elements to be metastable, such as 2H (AB), 4H (ABCB) and 6H (ABCACB). Exhaustive structural analysis, combining fine-powder X-ray and electron diffraction, afforded resolution of the crystal structure. We demonstrate that hexagonal Si obtained by high-pressure synthesis correspond to Si-4H polytype (ABCB stacking),5 in contrast with Si-2H (AB stacking) proposed previously. The sequence of transformations Si-III→Si-IV(4H)→Si-IV(6H) has been observed in situ by powder X-ray diffraction. This result agrees with prior calculations that predicted a higher stability of the 4H form over 2H form. Further physical characterization, combining experimental data and ab-initio calculations, have shown a good agreement with the established structure. Strong photoluminescence emission was observed in the visible region, for which we foresee optimistic perspectives for the use of this material in Si-based photovoltaics.
The study of silicon allotropic transformation in Na-Si and K-Si systems at high pressure, high temperature conditions indicated new interesting results on the second-order character of Si-II→Si-XI transformation and will be discussed in the presentation. The impact of the second order character on the topology of the pressure-temperature phase diagram of silicon will be analyzed.
(a) (b)
Figure 1. (a) HPHT phase transformations in pure Si. (b) In situ observations of Si-I→Si-II→Si-III transformation at ID06-LVP beamline of ESRF (Grenoble, France).
1. Kurakevych, O. O.; Le Godec, Y.; Strobel, T. A.; Kim, D. Y.; Crichton, W. A.; Guignard, J., Exploring silicon allotropy and chemistry by high pressure - high temperature conditions. J. Phys.: Conf. Ser. 2017, 950, 042049.
2. Kurakevych, O. O.; Le Godec, Y.; Crichton, W. A.; Strobel, T. A., Silicon allotropy and chemistry at extreme conditions. Energy Procedia 2016, 92, 839-844.
3. Kim, D. Y.; Stefanoski, S.; Kurakevych, O. O.; Strobel, T. A., Synthesis of an open-framework allotrope of silicon. Nature Materials 2015, 14 (2), 169-173.
4. Kurakevych, O. O.; Le Godec, Y.; Crichton, W. A.; Guignard, J.; Strobel, T. A.; Zhang, H. D.; Liu, H. Y.; Diogo, C. C.; Polian, A.; Menguy, N.; Juhl, S. J.; Gervais, C., Synthesis of Bulk BC8 Silicon Allotrope by Direct Transformation and Reduced-Pressure Chemical Pathways. Inorganic Chemistry 2016, 55 (17), 8943-8950.
5. Pandolfi, S.; Renero-Lecuna, C.; Le Godec, Y.; Baptiste, B.; Menguy, N.; Lazzeri, M.; Gervais, C.; Spektor, K.; Crichton, W. A.; Kurakevych, O. O., Nature of Hexagonal Silicon Forming via High-Pressure Synthesis: Nanostructured Hexagonal 4H Polytype. Nano Letters 2018, 18 (9), 5989-5995.
6. Zhang, H. D.; Liu, H. Y.; Wei, K. Y.; Kurakevych, O. O.; Le Godec, Y.; Liu, Z. X.; Martin, J.; Guerrette, M.; Nolas, G. S.; Strobel, T. A., BC8 Silicon (Si-III) is a Narrow-Gap Semiconductor. Physical Review Letters 2017, 118 (14).

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